Fully operational, (Fab-Finder owned) and running 200mm CMOS line. 6-7 levels of Al interconnect. 0.18um to 0.13um tech node. These tools are beautiful- we have all documentation and photographs available. 200+ tools moved out between October and March 2010. More tools moving out through May 2010.
Our prices are very low for tools of this quality- let us show you! Call today!
Our prices are very low for tools of this quality- let us show you! Call today!
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To see configuration details click on the Config link in far right column (if available).
| FF # | Module | Type | Model | Manufacture | Vintage | Serial Number | Config |
| 4 | Ash | Asher | GEMINI-ES | Axcelis | 20060831 | GES0053 | |
| 5 | Ash | ILD ASHER | TCA-3822 | TOK | 199408 | T-9405289 | |
| 6 | CMP | CMP | MIRRA-3400(ILD) | AMAT | 20001231 | E30877/P308460 | |
| 7 | CMP | CMP | MIRRA-3400(ILD) | AMAT | 20030930 | MIRRA-SIO | |
| 8 | CMP | CMP | MIRRA-3400(W) | AMAT | 20001231 | P308446/E30876 | |
| 9 | CMP | CMP | MIRRA-3400(W) | AMAT | 20030630 | E-43708/P-L582 | |
| 12 | CMP | CMP | MIRRA-3400(ILD) | AMAT | 19990731 | E-1027/P-9360 | |
| 13 | CMP | CMP | MIRRA-3400(ILD) | AMAT | 20000430 | P-L632/E-12222 | |
| 14 | CMP | CMP | MIRRA-3400(W) | AMAT | 19991231 | E-9373/P-L493 | |
| 15 | CMP | CMP | MIRRA-3400(W) | AMAT | 20000930 | P302422/E12212 | |
| 17 | CMP | CMP | 6DS-SP | STRASBAUGH | 19970930 | 1181295 | |
| 18 | CMP | CMP | 6DS-SP | STRASBAUGH | 19970930 | 1590596 | |
| 19 | CMP | POLISHER | STRB-6DS | STRASBAUGH | 199806 | 2191097 | |
| 20 | CMP | POLISHER | STRB-6DS(SiO) | STRASBAUGH | 199804 | 2100897 | |
| 21 | Diff | LPCVD | a808SC | TEL | 19990430 | A0000992502 | |
| 22 | Diff | LPCVD | a808SC(ASI) | TEL | 19971130 | A00009755272 | |
| 23 | Diff | LPCVD | a808SC(ASI) | TEL | 20001231 | A00000095263 | Config |
| 24 | Diff | LPCVD | a808SC(DASI) | TEL | 20001231 | A00000095261 | |
| 25 | Diff | LPCVD | a808SC(HTO) | TEL | 20001231 | A000000X5265 | |
| 26 | Diff | LPCVD | a808SCN(SIN) | TEL | 19971130 | A00009755281 | |
| 28 | Diff | Vertical anneal furnace | a808SD | TEL | 19970630 | 9735152 | |
| 31 | Diff | Vertical Diffusion | a808SD(BUOX+SACOX) | TEL | 19980430 | - | |
| 32 | Diff | Vertical Diffusion | a808SD(G-OX) | TEL | 19970930 | - | |
| 35 | Diff | Vertical Diffusion | a808SD(I-OX) | TEL | 19970930 | - | |
| 37 | Diff | Vertical Diffusion | a805D | TEL | 19950630 | 300009535044 | Config |
| 38 | Diff | Vertical Diffusion | a808SD(M1C-AN) | TEL | 19980430 | - | |
| 40 | Diff | Vertical Diffusion | a808SD(SCR-OX) | TEL | 19970930 | - | |
| 41 | Diff | Vertical Diffusion | a-808SD | TEL | 199710 | A00009765381 | |
| 42 | Diff | Vertical Diffusion | a-808SD | TEL | 199710 | A00009765380 | |
| 43 | Diff | SOS-CURE-FURNNACE | a-808SD | TEL | 199806 | A000097X5544 | |
| 44 | Diff | VERTICAL CVD FURNACE | a-808SC | TEL | 199505 | A00009510004 | |
| 45 | Diff | VERTICAL CVD FURNACE | a-808SC | TEL | 199408 | A00009430005 | |
| 46 | Diff | VERTICAL DIFF FURNACE | a-808SD | TEL | 199408 | A00009430012 | |
| 48 | Diff | VERTICAL DIFF FURNACE | a-808SD | TEL | 199505 | A00009510002 | |
| 49 | Diff | VERTICAL DIFF FURNACE | a-808SD | TEL | 199509 | A00009540062 | |
| 51 | Diff | VERTICAL DIFF FURNACE | a-808SD(WOX) | TEL | 199705 | A00009660293 | |
| 55 | Etch | Oxide Ething | UN85DI | TEL | 20000430 | U01128 | |
| 57 | Etch | Oxide Ething | UN85DI | TEL | 20000731 | U00973 | |
| 58 | Etch | Oxide Ething | UN85DI | TEL | 20010331 | U01133 | |
| 61 | Etch | Metal Etcher | OZ-5500 | Sumitomo-LAM | 19961130 | MZ075 | |
| 62 | Etch | Metal Etcher | OZ-5500 | Sumitomo-LAM | 19980131 | MZ356 | |
| 63 | Etch | W etch back Dry Etching | TE-8600STRIE | TEL | 19960131 | K86447 | |
| 64 | Etch | Etcher | MAS-8000 | Canon | 19960228 | 81411 | |
| 65 | Etch | Metal Etcher | OZ-3000 | Sumitomo-LAM | 19970930 | PZ466 | |
| 67 | Etch | Metal Etcher p | OZ5500 | Sumitomo-LAM | 19950831 | MZ-034 | |
| 68 | Etch | Metal Etcher p | OZ5500 | Sumitomo-LAM | 19960930 | MZ-105 | |
| 69 | Etch | Etcher | UNITYV285DP | TEL | 19971231 | 186 | |
| 70 | Etch | Etcher | CENTURA-MXP | AMAT | 200012 | 29805 | Config |
| 72 | Etch | Metal Etcher | TCP9600SE | Lam Research | 200210 | 42138 | Config |
| 73 | Etch | Metal Etcher | TCP9600-SE | Lam Research | 200207 | 42137 | Config |
| 74 | Etch | DRY ETCHER nit | TE-8401 | TEL | 200003 | K84839 | |
| 75 | Etch | DRY ETCHER nit | TE-8401 | TEL | 200004 | K84838 | |
| 76 | Etch | DRY ETCHER nit | TE-8401 | TEL | 200009 | K84849 | |
| 77 | Etch | DRY ETCHER nit | TE-8401 | TEL | 200209 | K84869 | |
| 78 | Etch | DRY ETCHER nit | TE-8401 | TEL | 200209 | K84874 | |
| 79 | Etch | SILICON OXIDE ETCHER | TE-8500 | TEL | 199409 | K85159 | |
| 80 | Etch | SILICON OXIDE ETCHER | TE-8500 | TEL | 199409 | K85158 | |
| 81 | Etch | W ETCHBACK ETCHER | TE-8600 | TEL | 199604 | K86552 | |
| 83 | implant | Ion Implanter | XR80 | AMAT | 199806 | M367 | Config |
| 84 | implant | ION IMPLANTATION | E220 | Varian | 199408 | 037100 | Config |
| 93 | Litho | Stepper | FPA-3000EX5 | Canon | 19990630 | 9025032EX5 | |
| 95 | Litho | Stepper | FPA-3000EX5 | Canon | 20000430 | 9115074 | |
| 367 | Litho | Coater/Developer | CT-MK5 | TEL | 19900331 | MD-529029 | |
| 111 | Litho | Coater | CT-MK7 | TEL | 19960131 | MD-715692 | |
| 112 | Litho | Coater | CT-MK7 | TEL | 19970930 | MD-7171115 | |
| 114 | Litho | Coater | SC-W80A-AV | DNS | 19950731 | 54700-2811 | |
| 116 | Litho | Coater/Developer | CLEANTRACK-ACT8(iW) | TEL | 200010 | MD-9101430 | Config |
| 119 | Litho | COATER/DEVELOPER | CT MK-8 | TEL | 199408 | MD-814156 | Config |
| 120 | Litho | COATER/DEVELOPER | CT MK-8 | TEL | 199507 | 814168 | Config |
| 123 | Litho | Photostabilizer System | FUSION-200PCU | Axcelis | 19950731 | PU5A126J | |
| 124 | Litho | UV Cure | UMA-1002-HC93FW | Ushio | 19960228 | 9511003 | |
| 125 | Metals | LPCVD | MB2-730 | TEL | 20000930 | MCJ-181 | |
| 127 | Metals | LPCVD | MB2-730(DCS) | TEL | 200012 | MCJ-190 | |
| 129 | Metals | Sputter | MB2-830(TI/C) | TEL | 19950630 | MPJ-09 | Config |
| 130 | Metals | Sputter | MB2-830(TI/TIN) | TEL | 19970930 | MPJ-023 | Config |
| 131 | Metals | Sputter | MB2-830(TIN) | TEL | 19960228 | MPJ-016 | Config |
| 145 | Metro | SEM | JSM-6340F | JEOL | 199710 | SM168010-35 | |
| 146 | Metro | SEM | JWS-7500E | JEOL | 19950831 | WS175018-41 | |
| 150 | Metro | SEM | S-8820 | Hitachi | 199602 | 8327-108820 | |
| 155 | Metro | SEM | S-8840 | Hitachi | 199804 | 910402 | |
| 156 | Metro | SEM | S-8840 | Hitachi | 199803 | 910409 | |
| 159 | Metro | Review SEM | SEMVISION_CX | AMAT | 20061231 | W-863 | |
| 160 | Metro | FIB | SMI8800 | SII | 19950331 | ||
| 163 | Metro | Overlay measurement | KLA-5200XP | KLA-Tencor | 19970930 | 2048 | |
| 164 | Metro | Wafer Inspecsion | OPTISTATION V | Nikon | 20061231 | ||
| 166 | Metro | Wafer Inspecsion | AL-2100 | Olympus | 20061231 | 108047 | |
| 167 | Metro | Resistivity mapping system | OMNIMAP RS35C | KLA-Tencor | 19950630 | 950216RS35CA | |
| 168 | Metro | Resistivity mapping system | RS35C | KLA-Tencor | 19960131 | 951013 | |
| 169 | Metro | Resistivity mapping system | RS35C | KLA-Tencor | 19960930 | 960124 | |
| 176 | Metro | Thin Film Measurement | NANOSPEC 8000XSE-NT | Nanometrics | 20000430 | 8000X-0100-0178 | Config |
| 178 | Metro | Thin Film Measurement | NANOSPEC 8000XSE-NT | Nanometrics | 20011031 | L8000X-03010228 | Config |
| 187 | Metro | Microscope | X6PDER-UBD | Nikon | 19900331 | - | |
| 188 | Metro | Microscope | X6PDER-UBD | Nikon | 19900331 | - | |
| 189 | Metro | Microscope | X6PDUW-UBD | Nikon | 19900331 | - | |
| 190 | Metro | Microscope | X6PDUW-UBD | Nikon | 19900331 | - | |
| 192 | Metro | WAFER INSPECTION | KLA-2112 | KLA-Tencor | 199603 | 696 | |
| 193 | Metro | WAFER INSPECTION | KLA-2115 | KLA-Tencor | 199710 | 1016 | |
| 194 | Metro | WAFER INSPECTION | KLA-2115 | KLA-Tencor | 199710 | 971 | |
| 198 | Metro | OVERLAY MEASUREMENT | KLA-5100 | KLA-Tencor | 199607 | 1234 | |
| 199 | Metro | Overlay measurement | KLA-5100 | KLA-Tencor | 19960228 | 1217 | |
| 200 | Metro | Overlay measurement | KLA5200 | KLA-Tencor | 199710 | 2074 | |
| 202 | Metro | Overlay measurement | KLA-5200XP | KLA-Tencor | 20060228 | 2259R | |
| 206 | Metro | Review Station | MIS-200 | Leica | 19960630 | 55MIS-0027 | |
| 207 | Metro | Non pattern wafer inspection | WM2500 | Topcon | 20061231 | 1010038 | |
| 208 | Metro | Wafer Inspecsion | IS2600 | Hitachi | 20061231 | 12675 | |
| 211 | Metro | Surface Analyzer | SURFSCAN 7600 | KLA-Tencor | 19950531 | 0295-494 | |
| 212 | Metro | Ellipsometer | LM-115AF-WH | Gaertner Scientific | 19950831 | 1628-AK | |
| 213 | Metro | Ellipsometer | FE-4 | Rudolph | 199505 | 10616 | |
| 221 | Metro | SHEET,RESIST | M-GAGE300 | KLA-Tencor | 199408 | 0294-0715 | |
| 223 | Metro | Resistivity mapping system | RESMAP468 | CDE | 20061231 | - | |
| 226 | Metro | Surface Profiler | P-2H | KLA-Tencor | 19950531 | 02950387 | |
| 230 | Metro | X-RAY FLUORE | S3630 | Rigaku | 2W0465 | ||
| 342 | Metro | SPV3030 | SPV3030 | SDI | 200204 | 97-050126 | |
| 232 | RTP | Lamp Annealer | LA-820 | DNS | 20001231 | 60710-5125 | |
| 235 | RTP | RTA | LA-W815-AV2.5 | DNS | 199408 | 53710-4028 | |
| 241 | Test | Vacuum Oven | LCV-242P | Tabai-Espec | 19900228 | - | |
| 260 | Test | Parametric Tester | 4062F | HP | 200304 | JP10B00135 | |
| 270 | Test | Parametric Tester | S-900 | Keithley | 199602 | QMO 2641 | |
| 271 | Test | Parametric Tester | S-900 | Keithley | 199602 | QMO 2640 | |
| 309 | Test | Prober | 78S | TEL | 199510 | 7SA2109 | |
| 310 | Test | Prober | 78S | TEL | 199408 | 7SA0101 | |
| 312 | Test | Prober | 78S FOR HP4062 | TEL | 199603 | 7SA2406 | |
| 321 | Test | C/V Plotter | 4280A | Agilent Technology | 19900331 | 2830J01571 | |
| 324 | Test | Spectro-photometer | HP8452A | HP | 199411 | 3104G02964 | |
| 325 | Test | Clean Oven | PVC-330 | Tabai-Espec | 19900228 | ||
| 326 | Test | Clean Oven | PVC-331M | Tabai-Espec | 19970930 | - | |
| 327 | Test | Clean Oven | PVC-331M | Tabai-Espec | 19970930 | - | |
| 328 | Test | Clean Oven | RCOF-2230 | Tabai-Espec | 19900228 | - | |
| 329 | Thin Film | CVD | CENTURA(3CHB) | AMAT | 19991231 | E-9240 | |
| 331 | Thin Film | SOG SYSTEM | CT MK-8 | TEL | 199408 | MD-814174 | |
| 332 | Thin Film | PLASMA CVD SYSTEM | P-5000(3CHB) | AMAT | 199505 | E2262 | |
| 334 | Thin Film | CVD | P-5000 | AMAT | 20010131 | 5348 | |
| 335 | Thin Film | PLASMA CVD MACHINE | P-5000(BPSG.Co) | AMAT | 200204 | ER045,P5903 | |
| 336 | Thin Film | CVD | Centura(SIO-2) | AMAT | 200309 | 317809 | |
| 337 | Thin Film | CVD MACHINE | P-5000SACVD | AMAT | 200405 | 5629 | |
| 338 | Thin Film | CVD | CENTURA 5200 | AMAT | 19950930 | E-5243 | |
| 339 | Thin Film | CVD | CENTURA 5200 | AMAT | 19971130 | E-7222 | |
| 343 | Wet | Wet Etching Systems | FC-820L | DNS | 20000331 | 57630-2026 | |
| 349 | Wet | Spin Processor (wet etch) | SP-W813-U | DNS | 19970131 | 56530-2539 | |
| 356 | Wet | WET STATION | UW-851 | TEL | 199805 | U730238 | |
| 357 | Diff | Vertical Diffusion | VDF-610SHT | TEL | 19910630 | A2-21978 | |
| 358 | Diff | Vertical anneal furnace | VDF-610SLT | TEL | 19910331 | AZ-21977 | |
| 360 | Backend | Grinder | DFG-82IF/8 | Disco | 19911231 | GG0175 | |
| 361 | Ash | Asher | RAM-250HAS | Ramco | 19900331 | 6405 | |
| 362 | Metro | Non pattern wafer inspection | WM-3 | Topcon | 19900331 | 81193106 |
We also have in our inventory some systems that are not up to our high standards. These systems have some issue preventing them from being fully operational or we were simply unable to test them before deinstallation. We are offering these systems at a significant discount to our already low prices.
| FF # | Module | Type | Model | Manufacture | Vintage | Serial Number | Config |
| 16 | CMP | CMP | 6DS-SP | STRASBAUGH | 19960331 | 900895 | |
| 47 | Diff | VERTICAL DIFF FURNACE | a-808SD | TEL | 199408 | A00009430013 | |
| 50 | Diff | VERTICAL DIFF FURNACE | a-808SD | TEL | 199910 | A00009660294 | |
| 56 | Etch | Oxide Ething | UN85DI | TEL | 20000731 | U01400 | |
| 59 | Etch | Ox Etcher | ALLIANCE9100 | Lam Research | 20000131 | 8788 | |
| 60 | Etch | Ox Etcher | ALLIANCE9100 | Lam Research | 20000331 | 8817 | |
| 96 | Litho | Stepper | FPA-3000EX5 | Canon | 20010228 | 115081 | |
| 147 | Metro | Defect Review SEM | RS-3000 | Hitachi | 20020930 | 0802-01 | |
| 149 | Metro | FE-SEM | S-4500 | Hitachi | 199408 | 7913-03 | |
| 151 | Metro | SEM | S-8820 | Hitachi | 199602 | 8328-018820 | |
| 158 | Metro | FIB | SMI-8800SE | SII | 199408 | 089P06-01 | |
| 195 | Metro | Wafer Inspection | KLA2118 | KLA-Tencor | 200007 | 1235 | |
| 196 | Metro | INSPECTION SYSTEM | KLA-2131 | KLA-Tencor | 199507 | 593 | |
| 197 | Metro | WAFER INSPECTION | KLA-2552 | KLA-Tencor | 199604 | 718 | |
| 224 | Metro | FILM THICKNESS | P2 | KLA-Tencor | 199408 | 4940323 | |
| 269 | Test | Parametric Tester | S900A | Keithley | 200304 | QMO:2630 | |
| 272 | Test | Prober + Parametric Tester | 78S S + 900 | TEL + Keithley | 199602 | 7SA2603 | |
| 273 | Test | Prober + Parametric Tester | 78S S + 900 | TEL + Keithley | 199602 | 7SA2602 | |
| 306 | Test | Prober | EG4080X | Electroglas | 199602 | H495120681 | |
| 307 | Test | Prober | MP-10 | MJC | 199408 | 5069405075 | |
| 311 | Test | Prober | 78S | TEL | 199408 | 7S0312 | |
| 323 | Test | Hot-electron analyzer | C3230-05,MP-10 | Hamamatsu Photonics | 199411 | 697208 | |
| 333 | Thin Film | SABPSG | P-5000 | AMAT | 20000430 | 6948 | |
| 359 | Backend | Grinder | DFG-82IF/8 | Disco | 19900228 | GG0126 | |
| 366 | Etch | Dry Etching | TE8500P(ATC) | TEL | 19940331 | K85109 |
